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Performance analysis of boron nitride embedded armchair graphene nanoribbon metal-oxide-semiconductor field effect transistor with Stone Wales defects

机译:具有Stone Wales缺陷的氮化硼嵌入式扶手椅石墨烯纳米带金属氧化物半导体场效应晶体管的性能分析

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摘要

We study the performance of a hybrid Graphene-Boron Nitride armchair nanoribbon (a-GNR-BN) n-MOSFET at its ballistic transport limit. We consider three geometric configurations 3p, 3p + 1, and 3p + 2 of a-GNR-BN with BN atoms embedded on either side (2, 4, and 6 BN) on the GNR. Material properties like band gap, effective mass, and density of states of these H-passivated structures are evaluated using the Density Functional Theory. Using these material parameters, self-consistent Poisson-Schrodinger simulations are carried out under the Non Equilibrium Green's Function formalism to calculate the ballistic n-MOSFET device characteristics. For a hybrid nanoribbon of width similar to 5 nm, the simulated ON current is found to be in the range of 265 mu A-280 mu A with an ON/OFF ratio 7.1 x 10(6)-7.4 x 10(6) for a V-DD = 0.68 V corresponding to 10 nm technology node. We further study the impact of randomly distributed Stone Wales (SW) defects in these hybrid structures and only 2.5% degradation of ON current is observed for SW defect density of 3.18%. (C) 2014 AIP Publishing LLC.
机译:我们研究了混合石墨烯-氮化硼扶手椅纳米带(a-GNR-BN)n-MOSFET在其弹道传输极限下的性能。我们考虑a-GNR-BN的三种几何构型3p,3p + 1和3p + 2,其中BN原子嵌在GNR的任一侧(2、4和6 BN)。使用密度泛函理论对这些H钝化结构的材料性能(如带隙,有效质量和状态密度)进行评估。使用这些材料参数,在非平衡格林函数形式下进行自洽的Poisson-Schrodinger仿真,以计算弹道n-MOSFET器件的特性。对于宽度类似于5 nm的混合纳米带,发现模拟的ON电流在265μA-280μA的范围内,其开/关比为7.1 x 10(6)-7.4 x 10(6)。 V-DD = 0.68 V,对应于10 nm技术节点。我们进一步研究了在这些混合结构中随机分布的Stone Wales(SW)缺陷的影响,对于SW缺陷密度为3.18%,仅观察到2.5%的ON电流衰减。 (C)2014 AIP Publishing LLC。

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